JPH031628B2 - - Google Patents

Info

Publication number
JPH031628B2
JPH031628B2 JP855688A JP855688A JPH031628B2 JP H031628 B2 JPH031628 B2 JP H031628B2 JP 855688 A JP855688 A JP 855688A JP 855688 A JP855688 A JP 855688A JP H031628 B2 JPH031628 B2 JP H031628B2
Authority
JP
Japan
Prior art keywords
impulse
metronome
beat
pad
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP855688A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63277991A (ja
Inventor
Hashingu Chen Shin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP855688A priority Critical patent/JPS63277991A/ja
Publication of JPS63277991A publication Critical patent/JPS63277991A/ja
Publication of JPH031628B2 publication Critical patent/JPH031628B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Circuits Of Receivers In General (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Percussion Or Vibration Massage (AREA)
JP855688A 1988-01-20 1988-01-20 メトロノーム信号表示装置 Granted JPS63277991A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP855688A JPS63277991A (ja) 1988-01-20 1988-01-20 メトロノーム信号表示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP855688A JPS63277991A (ja) 1988-01-20 1988-01-20 メトロノーム信号表示装置

Publications (2)

Publication Number Publication Date
JPS63277991A JPS63277991A (ja) 1988-11-15
JPH031628B2 true JPH031628B2 (en]) 1991-01-11

Family

ID=11696382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP855688A Granted JPS63277991A (ja) 1988-01-20 1988-01-20 メトロノーム信号表示装置

Country Status (1)

Country Link
JP (1) JPS63277991A (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3951499A1 (en) 2020-08-04 2022-02-09 Shin-Etsu Chemical Co., Ltd. Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component
EP3951498A1 (en) 2020-08-04 2022-02-09 Shin-Etsu Chemical Co., Ltd. Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component
EP4067999A1 (en) 2021-03-23 2022-10-05 Shin-Etsu Chemical Co., Ltd. Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0614994U (ja) * 1992-07-29 1994-02-25 株式会社創成電子 体感メトロノーム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5382541A (en) * 1976-12-27 1978-07-21 Seiko Epson Corp Wrist watch
JPS5897687A (ja) * 1981-12-07 1983-06-10 Koichi Oki 体に振動を伝える方法によるメトロノ−ム

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3951499A1 (en) 2020-08-04 2022-02-09 Shin-Etsu Chemical Co., Ltd. Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component
EP3951498A1 (en) 2020-08-04 2022-02-09 Shin-Etsu Chemical Co., Ltd. Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component
EP4067999A1 (en) 2021-03-23 2022-10-05 Shin-Etsu Chemical Co., Ltd. Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component

Also Published As

Publication number Publication date
JPS63277991A (ja) 1988-11-15

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